论文标题

Al上的3x3排序硅层的电子结构(111)

Electronic structure of a 3x3-ordered silicon layer on Al(111)

论文作者

Sato, Y., Fukaya, Y., Cameau, M., Kundu, A. K., Shiga, D., Yukawa, R., Horiba, K., Chen, C. -H., Huang, A., Jeng, H. -T., Ozaki, T., Kumigashira, H., Niibe, M., Matsuda, I.

论文摘要

AL(111)上硅(Si)层的3x3有序阶段的电子结构已通过角度分辨光发射光谱(ARPES)技术使用同步辐射进行了研究,并通过试验原子模型对其进行建模。确定了源自线性分散带的封闭的费米表面。蜂窝硅在Al(111)上的试验原子模型的带结构计算意味着金属频带源自具有DIRAC锥样分散曲线的Al-Si杂种状态。 Al(111)上的SI层可以是Xene的模型系统,可以通过覆盖物 - 基底相互作用实现无质量电子系统。

Electronic structure of the 3x3 ordered-phase of a silicon (Si) layer on Al(111) has been studied by angle resolved photoemission spectroscopy (ARPES) technique using synchrotron radiation and modeled by a trial atomic model. A closed Fermi surface originating from linearly dispersing band is identified. A band structure calculation of a trial atomic model of the honeycomb silicene on Al(111) implies that the metallic band originates from the Al-Si hybrid state that has the Dirac cone-like dispersion curves. The Si layer on Al(111) can be a model system of Xene to realize the massless electronic system through the overlayer-substrate interaction.

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