论文标题

在MOS $ _2 $中处于线路缺陷处的频带弯曲和价频段量化

Band Bending and Valence Band Quantization at Line Defects in MoS$_2$

论文作者

Murray, Clifford, van Efferen, Camiel, Jolie, Wouter, Fischer, Jeison Antonio, Hall, Joshua, Rosch, Achim, Krasheninnikov, Arkady V., Komsa, Hannu-Pekka, Michely, Thomas

论文摘要

通过高分辨率扫描隧道谱图($ 5 $ k)研究了电子结构正常在准烹饪MOS $ _2 $中的1D缺陷的变化。对于4 | 4e镜子双边界和岛边缘,发现价值和导带向线缺陷的弯曲强度向上弯曲,但对于4 | 4p镜子双边界没有。在发生上向上弯曲的地方,可以观察到价带中的量化能级。关注共同的4 | 4e镜子双边界,密度功能理论计算得出了其充电的估计,这与静电建模非常吻合。我们表明,也可以通过填充边界量化的电子频带来评估线电荷,从而对理论预测的量化极化电荷在MOS $ _2 $ irriper twin界限处进行测量。这些计算阐明了在MOS $ _2 $中以这些1D缺陷的带弯曲和充电的起源。 4 | 4e镜面双边界不仅会损害由于带弯曲而引起的电子和孔的电荷传输,而且孔还会受到潜在的屏障的影响,这是根据边界两侧的量化能量景观独立性推断出的。

The variation of the electronic structure normal to 1D defects in quasi-freestanding MoS$_2$, grown by molecular beam epitaxy, is investigated through high resolution scanning tunneling spectroscopy at $5$K. Strong upwards bending of valence and conduction bands towards the line defects is found for the 4|4E mirror twin boundary and island edges, but not for the 4|4P mirror twin boundary. Quantized energy levels in the valence band are observed wherever upwards band bending takes place. Focusing on the common 4|4E mirror twin boundary, density functional theory calculations give an estimate of its charging, which agrees well with electrostatic modeling. We show that the line charge can also be assessed from the filling of the boundary-localized electronic band, whereby we provide a measurement of the theoretically predicted quantized polarization charge at MoS$_2$ mirror twin boundaries. These calculations elucidate the origin of band bending and charging at these 1D defects in MoS$_2$. The 4|4E mirror twin boundary not only impairs charge transport of electrons and holes due to band bending, but holes are additionally subject to a potential barrier, which is inferred from the independence of the quantized energy landscape on either side of the boundary.

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