论文标题
在Nio/Pt薄膜中通过电流切换的抗铁磁域中Néel矢量取向的鉴定
Identification of Néel vector orientation in antiferromagnetic domains switched by currents in NiO/Pt thin films
论文作者
论文摘要
了解抗铁磁秩序的电气操纵是一个至关重要的方面,它可以设计在THZ频率下工作的抗铁磁器件。以材料平台为重点将防铁磁性NIO/PT薄膜作为材料平台,我们确定了可以通过电流切换的域的晶体学取向,并量化了NéelVector的方向变化。我们证明了通过当前脉冲在不同的T域之间进行电动切换,发现这些域中的néel矢量取向沿$ [\ pm5 \ \ \ pm5 \ 19] $,与散装$ <11 \ bar {2}> $方向相比。 néelVector$ \ textbf {n} $切换的最终状态在当前脉冲$ \ textbf {j} $沿$ [1 \ \ \ pm1 \ 0] $方向为$ \ textbf {n} \ parallel \ parallel \ textbf {j} $。假设这种变化仅来自磁弹性效应,我们将观察到的néel矢量取向和薄膜中的应变进行比较,我们将磁弹性耦合系数的数量级定量为$ b_ {0}+2b_ {1}+2b_ {1} = 3*10^7 J \ m^\ m^M^{-3} $。此信息是理解抗铁磁体中电流引起的切换以及设计和使用诸如Spintronic设备中的活动元件之类的设备的关键。
Understanding the electrical manipulation of antiferromagnetic order is a crucial aspect to enable the design of antiferromagnetic devices working at THz frequency. Focusing on collinear insulating antiferromagnetic NiO/Pt thin films as a materials platform, we identify the crystallographic orientation of the domains that can be switched by currents and quantify the Néel vector direction changes. We demonstrate electrical switching between different T-domains by current pulses, finding that the Néel vector orientation in these domains is along $[\pm5\ \pm5\ 19]$, different compared to the bulk $<11\bar{2}>$ directions. The final state of the Néel vector $\textbf{n}$ switching after current pulses $\textbf{j}$ along the $[1\ \pm1\ 0]$ directions is $\textbf{n}\parallel \textbf{j}$. By comparing the observed Néel vector orientation and the strain in the thin films, assuming that this variation arises solely from magnetoelastic effects, we quantify the order of magnitude of the magnetoelastic coupling coefficient as $b_{0}+2b_{1}=3*10^7 J\ m^{-3}$ . This information is key for the understanding of current-induced switching in antiferromagnets and for the design and use of such devices as active elements in spintronic devices.