论文标题
外延超导型杂种的阳极氧化
Anodic Oxidation of Epitaxial Superconductor-Semiconductor Hybrids
论文作者
论文摘要
我们展示了一种基于阳极氧化(AO)的混合半导体 - 渗透导体异质结构的新制造过程,从而可以控制外观上的Al膜的稀疏。在绝缘GAAS底物上生长的氧化外延膜的结构和运输研究揭示了空间不均匀性以及临界温度和磁场的增强。 Oxidation of epitaxial Al on hybrid InAs heterostructures with a conducting quantum well show similarly enhanced superconducting properties transferred to the two-dimensional electron gas (2DEG) by proximity effect, with critical perpendicular magnetic fields up to 3.5 T. An insulating AlOx film, that passivates the heterostructure from exposure to air, is obtained by complete oxidation of the Al.它同时消除了剥离损坏基础半导体的Al的需求。 AO钝化产生的2DEG迁移率是类似设备的两倍,而Al通过湿蚀刻去除。 AO pappaptiv的大厅杆显示量子大厅的特征在2.5 T的横向场中出现,低于薄膜的临界横向场,最终使量子厅效应和超导性的透明耦合。 AO变薄和钝化与标准光刻技术兼容,横向分辨率低于50 nm。我们通过实现基于半导体的约瑟夫森连接来证明AO的局部模式,运行高达0.3 t t。
We demonstrate a new fabrication process for hybrid semiconductor-superconductor heterostructures based on anodic oxidation (AO), allowing controlled thinning of epitaxial Al films. Structural and transport studies of oxidized epitaxial Al films grown on insulating GaAs substrates reveal spatial non-uniformity and enhanced critical temperature and magnetic fields. Oxidation of epitaxial Al on hybrid InAs heterostructures with a conducting quantum well show similarly enhanced superconducting properties transferred to the two-dimensional electron gas (2DEG) by proximity effect, with critical perpendicular magnetic fields up to 3.5 T. An insulating AlOx film, that passivates the heterostructure from exposure to air, is obtained by complete oxidation of the Al. It simultaneously removes the need to strip Al which damages the underlying semiconductor. AO passivation yielded 2DEG mobilities two times higher than similar devices with Al removed by wet etching. An AO-passivated Hall bar showed quantum Hall features emerging at a transverse field of 2.5 T, below the critical transverse field of thinned films, eventually allowing transparent coupling of quantum Hall effect and superconductivity. AO thinning and passivation are compatible with standard lithographic techniques, giving lateral resolution below <50 nm. We demonstrate local patterning of AO by realizing a semiconductor-based Josephson junction operating up to 0.3 T perpendicular.