论文标题
等电子扰动到$ f $ - $ d $ - 电子杂交和uru $ _2 $ si $ _2 $中隐藏订单的增强
Isoelectronic perturbations to $f$-$d$-electron hybridization and the enhancement of hidden order in URu$_2$Si$_2$
论文作者
论文摘要
在URU $ _2-x $ os $ _x $ _x $ _2 $ _2 $ _2 $ _2 $ _2 $ = 0.28的单晶上进行了电阻率测量,在静水压力下最高$ p $ = 2 GPA。 As the Os concentration, $x$ , is increased, (1) the lattice expands, creating an effective negative chemical pressure $P_{ch}$($x$), (2) the hidden order (HO) phase is enhanced and the system is driven toward a large-moment antiferromagnetic (LMAFM) phase, and (3) less external pressure $P_{c}$ is required to induce the HO to LMAFM phase transition.我们比较了$ t(x)$,$ t(p)$相位行为在此处报告的uru $ _2-x $ os $ _x $ _x $ si $ _2 $ _2 $系统与以前的报道有关在用$ p $或类似于Uru $ _2 $ _x $ _x $ _x $ _x $ si $ _x $ _2 $ _2 $ _2 $ _2 $ _2 $ _2 $ _2 $ _2 $ _2 $ _2 $ _2 $ _2 $ _2 $ _2 $增强的报告中$ p_ {ch} $($ x $)。值得注意的是,压力,FE替代和OS替代是唯一已知的扰动,可以增强HO相并在URU $ _2 $ _2 $ si $ _2 $中诱导第一阶过渡到LMAFM阶段。我们提出了一种场景,在这种情况下,Fe和Os离子的压力或等链替代的应用导致U-5 $ F $ - u-5 $ f $ - 以及过渡金属$ d $ -Electron状态的杂交增加,从而导致了Parmagnetic阶段的电子不稳定性,并在uRu $ $ __2 $ __2 $ __2 $ __2 $ si of hohos apemagnetiac阶段和同一稳定性。包括紧密结合近似中的计算,以确定U-5 $ F $电子之间的杂交强度和Fe,Ru和OS的每个等电子过渡金属$ D $ -D $ - 电子状态。
Electrical resistivity measurements were performed on single crystals of URu$_2-x$Os$_x$Si$_2$ up to $x$ = 0.28 under hydrostatic pressure up to $P$ = 2 GPa. As the Os concentration, $x$ , is increased, (1) the lattice expands, creating an effective negative chemical pressure $P_{ch}$($x$), (2) the hidden order (HO) phase is enhanced and the system is driven toward a large-moment antiferromagnetic (LMAFM) phase, and (3) less external pressure $P_{c}$ is required to induce the HO to LMAFM phase transition. We compare the $T(x)$, $T(P)$ phase behavior reported here for the URu$_2-x$Os$_x$Si$_2$ system with previous reports of enhanced HO in URu$_2$Si$_2$ upon tuning with $P$, or similarly in URu$_2-x$Fe$_x$Si$_2$ upon tuning with positive $P_{ch}$($x$). It is noted that pressure, Fe substitution, and Os substitution are the only known perturbations that enhance the HO phase and induce the first order transition to the LMAFM phase in URu$_2$Si$_2$. We present a scenario in which the application of pressure or the isoelectronic substitution of Fe and Os ions for Ru results in an increase in the hybridization of the U-5$f$- and transition metal $d$-electron states which leads to electronic instability in the paramagnetic phase and a concurrent stability of HO (and LMAFM) in URu$_2$Si$_2$. Calculations in the tight binding approximation are included to determine the strength of hybridization between the U-5$f$ electrons and each of the isoelectronic transition metal $d$-electron states of Fe, Ru, and Os.