论文标题

平行动量在量子井状态耦合中的关键作用在多堆叠纳米膜中:角度分辨光发射研究

Critical role of parallel momentum in quantum well state couplings in multi-stacked nanofilms: an angle resolved photoemission study

论文作者

Lee, Woojoo, Pan, Chi-Ruei, Nam, Hyoungdo, Chou, Mei-Yin, Shih, Chih-Kang

论文摘要

我们使用角度分辨的光发射光谱(ARPE)来研究外延薄PB和AG膜中电子量子井状态(QWS)的耦合。更具体地说,我们研究了AG/SI,PB/SI和PB/AG/SI系统。我们发现,平行动量起着非常深刻的作用,决定了如何将两个相邻的量子井在界面上以电子方式耦合。我们透露,在PB/Ag双金属系统中,能量与动量(E与K)空间中存在两个明显不同的机制。在一个制度中,Ag和Pb中的电子状态紧密耦合,从而为双金属系统提供了一组新的量子井状态。在另一个体制中,单个金属层中的电子状态保留在其各自的区域,就好像它们完全解耦一样。使用密度功能理论的计算来证实该结果。我们进一步揭示了与电子折射和整个界面之间的总内反射相关的基本机制。

We use angle resolved photoemission spectroscopy (ARPES) to investigate the coupling of electron quantum well states (QWS) in epitaxial thin Pb and Ag films. More specifically, we investigate the Ag/Si, Pb/Si, and Pb/Ag/Si systems. We found that the parallel momentum plays a very profound role determining how two adjacent quantum wells are coupled electronically across the interface. We revealed that in the Pb/Ag bimetallic system, there exist two distinctly different regimes in the energy versus momentum (E vs. k) space. In one regime the electronic states in Ag and Pb are strongly coupled resulting in a new set of quantum well states for the bi-metallic system. In the other regime the electronic states in individual metallic layers are retained in their respective regions, as if they are totally decoupled. This result is corroborated by calculations using density functional theory. We further unravel the underlying mechanism associated with the electron refraction and total internal reflection across the interface.

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