论文标题
氧对光信号的研究对氢化无定形/晶体硅薄膜的影响
Studies on optical signal due to oxygen effect on hydrogenated amorphous/crystalline silicon thin-films
论文作者
论文摘要
我们已经研究了氧对氧的结构和光学特性方面的氢化无定形/晶体硅膜的影响。在微晶和无定形过渡区域之间制造了不同氢化的氧化硅（SIO：H）和硅（SI：H）膜。 X射线衍射，拉曼，FTIR和UV-VIS发射光谱法已用于表征不同的膜。将结果与不同类型膜的结果进行比较，例如氢化的无定形氧化硅（A-SIO：H），氢化的无定形硅（A-SI：H）和微晶硅（$ $ $ C-SI：H）膜揭示了它们作为Solar Cell的优势物质的优势。 X射线衍射，FTIR和拉曼光谱分析表明，H稀释效应的差异对膜和光学性质的结构具有重大影响。对无定形硅氧和硅水合合金膜的光致发光分析已确定其有效应用，适合基于SI的光发射器件。 1.83 eV的大型光丝带隙和2.0 eV时强的光发光的出现验证了A-SIO：H膜的适用性，作为太阳能电池的更好替代方案。
We have studied the effects of oxygen on hydrogenated amorphous/crystalline silicon films in terms of their structural and optical properties. Different hydrogenated silicon oxide (SiO:H) and silicon (Si:H) films are fabricated between microcrystalline and amorphous transition region. X-ray diffraction, Raman, FTIR and UV-Vis emission spectrometry have been used to characterize different films. A comparison of the results with those of different types of films like hydrogenated amorphous silicon oxide (a-SiO:H), hydrogenated amorphous silicon (a-Si:H) and microcrystalline silicon ($μ$c-Si:H) films reveal their superiority as an excellent substance for solar cell. X-ray diffraction, FTIR and Raman spectral analysis show that difference of the H dilution effect has a major effect on the structure of the film and the optical properties. Photoluminescence analysis of amorphous silicon-oxygen and silicon-hydride alloy films has established their efficient application appropriate as Si based light emitting devices. A large optical band gap of 1.83 eV and appearance of strong photo luminescence at 2.0 eV validates the applicability of a-SiO:H film as a better alternative for the solar cells.
