论文标题
锗丝层表面合金的生长,然后是原位扫描隧道显微镜:没有德国烯的形成
Growth of germanium-silver surface alloys followed by in situ scanning tunneling microscopy: Absence of germanene formation
论文作者
论文摘要
理论研究表明,可以从组IV石墨烯类似物(Silicene,Germanene,Stanene)的新物理特性(例如可调间隙开口或量子旋转效应)。尽管已经进行了许多关于这种SI,GE,SN单层生长的研究,但其六边形组织的演示通常是基于后生成的表征,并且它们与石墨烯的类比仍然是构造的。我们的实时扫描隧道显微镜(STM)在380--430 K温度范围内的GE沉积期间的GE沉积期(111)观察表明,Ag原子参与了第二层形成的所有结构,拒绝了在该底物在该底物的情况下可能形成德国烯的可能形成。 STM对GE原子扩散的观察表明,在这种温度下,Agand Ge原子之间的易于交换是造成GE-AG表面合金的。
Theoretical studies have shown that new physical properties such as tunable gap openings or quantum spinHall effects could be expected from group-IV graphene analogs (silicene, germanene, stanene). While therehave been numerous studies of growth of such Si, Ge, Sn monolayers, the demonstration of their hexagonalorganization has been often based on postgrowth characterization, and their analogy to graphene has remainedcontroversial. Our real-time scanning tunneling microscopy (STM) observation during Ge deposition on Ag(111)in the 380--430 K temperature range reveals that Ag atoms are involved in all the structures observed beforethe formation of a second layer, rejecting the possible formation of germanene on this substrate within theseexperimental conditions. The observation by STM of Ge atomic diffusion shows that easy exchange between Agand Ge atoms is responsible for the Ge-Ag surface alloying at such temperatures.