论文标题

深度学习辅助管道,用于有效的后硅质调整

A Deep-Learning-Aided Pipeline for Efficient Post-Silicon Tuning

论文作者

Liao, Yiwen, Yang, Bin, Latty, Raphaël, Rivoir, Jochen

论文摘要

在后硅验证中,调整是为了找到调谐旋钮的值,这可能是过程参数和/或已知操作条件的函数。从这个意义上讲,更有效的调整需要根据测试的设备(DUT)来确定最关键的调整旋钮和过程参数。这通常是由经验丰富的专家手动进行的。但是,随着越来越复杂的芯片,对大量原始变量的手动检查变得更具挑战性。在这项工作中,我们利用神经网络有效地选择最相关的变量,并提出相应的深度学习辅助管道进行有效的调整。

In post-silicon validation, tuning is to find the values for the tuning knobs, potentially as a function of process parameters and/or known operating conditions. In this sense, an more efficient tuning requires identifying the most critical tuning knobs and process parameters in terms of a given figure-of-merit for a Device Under Test (DUT). This is often manually conducted by experienced experts. However, with increasingly complex chips, manual inspection on a large amount of raw variables has become more challenging. In this work, we leverage neural networks to efficiently select the most relevant variables and present a corresponding deep-learning-aided pipeline for efficient tuning.

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