论文标题
在无定形金属基板上的氦膜上方的高密度电子的测量
Measurement of High Density Electrons Above a Helium Film on an Amorphous Metal Substrate
论文作者
论文摘要
我们已经测量了与金属底物支撑的薄氦膜结合的二维电子系统。我们报告了通过开尔文探针技术获得的电子密度的测量。基础金属底物是一种无定形的金属合金（TAWSI），由于其低表面粗糙度和均匀的工作功能，它可以支持大均匀密度。我们发现，该基材能够支持足够高的密度，以使电子预期为费米重量。
We have measured two-dimensional electron systems bound to a thin helium film supported by a metallic substrate. We report on our measurement of electron density obtained via a Kelvin probe technique. The underlying metallic substrate is an amorphous metallic alloy (TaWSi), which can support large uniform densities due to its low surface roughness and homogeneous work function. We find that this substrate is able to support high enough densities that the electrons are expected to be Fermi-degenerate.
