论文标题
将纳米支持的GAN量子点缩放到低于10 nm的限制,从而完全抑制了巨大的内置电位
Scaling nanowire-supported GaN quantum dots to the sub-10-nm limit, yielding complete suppression of the giant built-in potential
论文作者
论文摘要
GAN的纳米支持的量子点(NWQD)是一种非常规的纳米结构,对于一般的紫外线光子学而言,尤其是室温单光子产生,非常有前途。尽管GAN-NWQD具有多个有希望的属性,但利用其全部潜力的关键挑战是将QD的横向尺寸降低到GAN中的激子Bohr-Radius的顺序。同样重要的是,由于自发和压电极化,抑制内置电场,这会对辐射重组寿命产生不利影响。我们在这里报告了一种简单但功能强大的单步上延长增长技术的创新,以实现这两个目标。通过将GAN纳米线的受控和点播热分解与我们先前开发的通过ALN限制抑制相同的策略相结合,我们证明了NWQD直径的确可以减少到真正的强度量化量的限制。在这些超级刻度的GAN QD中,我们表明内置电场几乎完全被抑制了。在这项工作中开发的NWQD制造策略可能为基于GAN制造高效的经典和量子紫外线发射器的制造铺平了道路。
The nanowire-supported quantum dot (NWQD) of GaN is an unconventional nanostructure, which is extremely promising for realization of UV photonics in general, and room-temperature single photon generation, in particular. While GaN-NWQDs have several promising attributes, the crucial challenge in exploiting their full potential, is to reduce the lateral dimensions of the QDs, to the order of the exciton Bohr-radius in GaN. Also critical is to suppress the built-in electric field due to spontaneous and piezoelectric polarization, which adversely affects the radiative recombination lifetime. We report here the innovation of a simple yet powerful single-step epitaxial growth technique, to achieve both of these targets. By combining controlled and on-demand thermal decomposition of GaN nanowires, with our previously-developed strategy of inhibiting the same via AlN-capping, we demonstrate that the NWQD-diameter can indeed be reduced to the truly strong-quantum-confinement limit. In these ultra-scaled GaN QDs, we show that the built-in electric fields are almost completely suppressed. The NWQD fabrication-strategy developed in this work may pave the way for fabrication of highly efficient classical and quantum UV-emitters based on GaN.