论文标题

高素质诱导的局部修改vo $ _2 $薄膜的电子特性

High-strain-induced local modification of the electronic properties of VO$_2$ thin films

论文作者

Birkhölzer, Yorick A., Sotthewes, Kai, Gauquelin, Nicolas, Riekehr, Lars, Jannis, Daen, van der Minne, Emma, Bu, Yibin, Verbeeck, Johan, Zandvliet, Harold J. W., Koster, Gertjan, Rijnders, Guus

论文摘要

钒二氧化钒(VO2)由于其众所周知的半导体金属过渡,是电子和光学开关应用的流行候选。由于长和短距离弹性扭曲的相互作用以及对称变化以及电子结构的变化,它的研究是具有挑战性的。晶格和电子自由度的固有耦合为单个域的机械致动途径开辟了道路。在这项工作中,我们表明我们可以使用原子力显微镜通过纳米化的金属探针来操纵和监视VO2的可逆半导体到金属的转变。在临界压力下,我们可以通过大量的电导率调制可逆地启动相变。通过VO2的主要电荷载体注入机制观察到通过VO2 - 金属接触的直接隧穿。隧道屏障是由VO2的非常细但持续绝缘的表面层形成的。诱导过渡的必要压力随温度而降低。此外,我们测量了迄今未开发的方案中的相共存线。我们的研究提供了有关VO2特性的压力诱导的电子修饰以及纳米级金属氧化物接触的有价值的信息,这可以帮助将来的氧化物电子产品设计。

Vanadium dioxide (VO2) is a popular candidate for electronic and optical switching applications due to its well-known semiconductor-metal transition. Its study is notoriously challenging due to the interplay of long and short range elastic distortions, as well as the symmetry change, and the electronic structure changes. The inherent coupling of lattice and electronic degrees of freedom opens the avenue towards mechanical actuation of single domains. In this work, we show that we can manipulate and monitor the reversible semiconductor-to-metal transition of VO2 while applying a controlled amount of mechanical pressure by a nanosized metallic probe using an atomic force microscope. At a critical pressure, we can reversibly actuate the phase transition with a large modulation of the conductivity. Direct tunneling through the VO2-metal contact is observed as the main charge carrier injection mechanism before and after the phase transition of VO2. The tunneling barrier is formed by a very thin but persistently insulating surfacelayer of the VO2. The necessary pressure to induce the transition decreases with temperature. In addition, we measured the phase coexistence line in a hitherto unexplored regime. Our study provides valuable information on pressure-induced electronic modifications of the VO2 properties, as well as on nanoscale metal-oxide contacts, which can help in the future design of oxide electronics.

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