论文标题
HGTE(001)中的拓扑带反演:光发射的表面和散装签名
Topological band inversion in HgTe(001): surface and bulk signatures from photoemission
论文作者
论文摘要
HGTE是一种多功能的拓扑材料,可以实现各种拓扑状态,包括二维和三维(3D)拓扑绝缘子和拓扑半学。然而,对其电子结构的定量理解仍然具有挑战性,特别是由于TE 5P衍生的价电子与浅层结合能的Hg 5D核心状态的耦合。我们基于角度分辨的光电子光谱和密度功能理论,介绍了3D拓扑结构剂制度中应变的HGTE(001)膜中电子结构(001)膜中电子结构的联合实验和理论研究。结果根据(i)电子带分散体和轨道对称性,(ii)对电子结构的表面和大量贡献建立了详细的一致性,(iii)Hg 5D状态在价波段形成中的重要性。在理论的支持下,我们的实验直接对HGTE中的范式带倒置进行了映射,从而在其非平凡的带拓扑基础上进行了构图。
HgTe is a versatile topological material and has enabled the realization of a variety of topological states, including two- and three-dimensional (3D) topological insulators and topological semimetals. Nevertheless, a quantitative understanding of its electronic structure remains challenging, in particular due to coupling of the Te 5p-derived valence electrons to Hg 5d core states at shallow binding energy. We present a joint experimental and theoretical study of the electronic structure in strained HgTe(001) films in the 3D topological-insulator regime, based on angle-resolved photoelectron spectroscopy and density functional theory. The results establish detailed agreement in terms of (i) electronic band dispersions and orbital symmetries, (ii) surface and bulk contributions to the electronic structure, and (iii) the importance of Hg 5d states in the valence-band formation. Supported by theory, our experiments directly image the paradigmatic band inversion in HgTe, underlying its non-trivial band topology.